Scaling FDSOI technology down to 7 nm - A physical modeling study based on 3D phase-space subband boltzmann transport

  1. Stanojević, Z.
  2. Baumgartner, O.
  3. Schanovsky, F.
  4. Strof, G.
  5. Kernstock, C.
  6. Karner, M.
  7. Medina, J.M.G.
  8. Ruiz, F.G.
  9. Godoy, A.
  10. Gámiz, F.
Actas:
2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2018

ISBN: 9781538648117

Año de publicación: 2018

Volumen: 2018-January

Páginas: 1-4

Tipo: Aportación congreso

DOI: 10.1109/ULIS.2018.8354741 GOOGLE SCHOLAR