In situ characterization of bias instability in bare SOI wafers by pseudo-MOSFET technique

  1. Marquez, C.
  2. Rodriguez, N.
  3. Fernandez, C.
  4. Ohata, A.
  5. Gamiz, F.
  6. Allibert, F.
  7. Cristoloveanu, S.
Aldizkaria:
IEEE Transactions on Device and Materials Reliability

ISSN: 1558-2574 1530-4388

Argitalpen urtea: 2014

Alea: 14

Zenbakia: 3

Orrialdeak: 878-883

Mota: Artikulua

DOI: 10.1109/TDMR.2014.2332818 GOOGLE SCHOLAR