Unipolar resistive switching behavior in Al2O3/HfO2 multilayer dielectric stacks: Fabrication, characterization and simulation

  1. Maestro-Izquierdo, M.
  2. Gonzalez, M.B.
  3. Jimenez-Molinos, F.
  4. Moreno, E.
  5. Roldan, J.B.
  6. Campabadal, F.
Journal:
Nanotechnology

ISSN: 1361-6528,  0957-4484

Year of publication: 2020

Volume: 31

Issue: 13

Type: Article

DOI: 10.1088/1361-6528/AB5F9A GOOGLE SCHOLAR
Data source: Scopus