Thermal study of multilayer resistive random access memories based on HfO 2 and Al 2 O 3 oxides
- Cazorla, M.
- Aldana, S.
- Maestro, M.
- González, M.B.
- Campabadal, F.
- Moreno, E.
- Jiménez-Molinos, F.
- Roldán, J.B.
ISSN: 2166-2754, 2166-2746
Year of publication: 2019
Volume: 37
Issue: 1
Type: Article