Influence of source-drain engineering and temperature on split-capacitance characteristics of FDSOI p-i-n gated diodes
- Sasaki, K.R.A.
- Navarro, C.
- Bawedin, M.
- Andrieu, F.
- Martino, J.A.
- Cristoloveanu, S.
Actes:
2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016
ISBN: 9781509043903
Any de publicació: 2016
2016 SOI-3D-Subthreshold Microelectronics Technology Unified Conference, S3S 2016
Tipus: Aportació congrés