Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature

  1. Rodríguez-Navarro, A.
  2. Otaño-Rivera, W.
  3. García-Ruiz, J.M.
  4. Messier, R.
  5. Pilione, L.J.
Journal:
Journal of Materials Research

ISSN: 0884-2914

Year of publication: 1997

Volume: 12

Issue: 7

Pages: 1850-1855

Type: Article

DOI: 10.1557/JMR.1997.0254 GOOGLE SCHOLAR
Data source: Scopus