Development of preferred orientation in polycrystalline AlN thin films deposited by rf sputtering system at low temperature

  1. Rodríguez-Navarro, A.
  2. Otaño-Rivera, W.
  3. García-Ruiz, J.M.
  4. Messier, R.
  5. Pilione, L.J.
Aldizkaria:
Journal of Materials Research

ISSN: 0884-2914

Argitalpen urtea: 1997

Alea: 12

Zenbakia: 7

Orrialdeak: 1850-1855

Mota: Artikulua

DOI: 10.1557/JMR.1997.0254 GOOGLE SCHOLAR