Variability in HfO2-based memristors described with a new bidimensional statistical technique

  1. Acal, C.
  2. Maldonado, D.
  3. Cantudo, A.
  4. González, M.B.
  5. Jiménez-Molinos, F.
  6. Campabadal, F.
  7. Roldán, J.B.
Journal:
Nanoscale

ISSN: 2040-3372 2040-3364

Year of publication: 2024

Volume: 16

Issue: 22

Pages: 10812-10818

Type: Article

DOI: 10.1039/D4NR01237B GOOGLE SCHOLAR lock_openOpen access editor