Numerical study of synaptic behavior in amorphous HfO2-based ferroelectric-like FETs generated by voltage-driven ion migration

  1. Cuesta-Lopez, J.
  2. Ganeriwala, M.D.
  3. Marin, E.G.
  4. Toral-Lopez, A.
  5. Pasadas, F.
  6. Ruiz, F.G.
  7. Godoy, A.
Revue:
Journal of Applied Physics

ISSN: 1089-7550 0021-8979

Année de publication: 2024

Volumen: 136

Número: 12

Type: Article

DOI: 10.1063/5.0212084 GOOGLE SCHOLAR