Hole effective mass in silicon inversion layers with different substrate orientations and channel directions

  1. Donetti, L.
  2. Gámiz, F.
  3. Thomas, S.
  4. Whall, T.E.
  5. Leadley, D.R.
  6. Hellström, P.-E.
  7. Malm, G.
  8. Östling, M.
Revista:
Journal of Applied Physics

ISSN: 0021-8979

Any de publicació: 2011

Volum: 110

Número: 6

Tipus: Article

DOI: 10.1063/1.3639281 GOOGLE SCHOLAR