Hole effective mass in silicon inversion layers with different substrate orientations and channel directions

  1. Donetti, L.
  2. Gámiz, F.
  3. Thomas, S.
  4. Whall, T.E.
  5. Leadley, D.R.
  6. Hellström, P.-E.
  7. Malm, G.
  8. Östling, M.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2011

Volumen: 110

Número: 6

Type: Article

DOI: 10.1063/1.3639281 GOOGLE SCHOLAR