Thickness Characterization by Capacitance Derivative in FDSOI p-i-n Gated Diodes

  1. Navarro, C.
  2. Bawedin, M.
  3. Andrieu, F.
  4. Cluzel, J.
  5. Solaro, Y.
  6. Fonteneau, P.
  7. Martinez, F.
  8. Sagnes, B.
  9. Cristoloveanu, S.
Büchersammlung:
2015 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS)

ISSN: 2330-5738,  2472-9132

ISBN: 978-1-4799-6911-1

Datum der Publikation: 2015

Seiten: 189-192

Kongress: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon

Art: Konferenz-Beitrag

GOOGLE SCHOLAR
Fuente de los datos: WoS