Thickness Characterization by Capacitance Derivative in FDSOI p-i-n Gated Diodes

  1. Navarro, C.
  2. Bawedin, M.
  3. Andrieu, F.
  4. Cluzel, J.
  5. Solaro, Y.
  6. Fonteneau, P.
  7. Martinez, F.
  8. Sagnes, B.
  9. Cristoloveanu, S.
Liburu bilduma:
2015 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS)

ISSN: 2330-5738,  2472-9132

ISBN: 978-1-4799-6911-1

Argitalpen urtea: 2015

Orrialdeak: 189-192

Biltzarra: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon

Mota: Biltzar ekarpena

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Datuen iturria: WoS