Thickness Characterization by Capacitance Derivative in FDSOI p-i-n Gated Diodes

  1. Navarro, C.
  2. Bawedin, M.
  3. Andrieu, F.
  4. Cluzel, J.
  5. Solaro, Y.
  6. Fonteneau, P.
  7. Martinez, F.
  8. Sagnes, B.
  9. Cristoloveanu, S.
Collection de livres:
2015 JOINT INTERNATIONAL EUROSOI WORKSHOP AND INTERNATIONAL CONFERENCE ON ULTIMATE INTEGRATION ON SILICON (EUROSOI-ULIS)

ISSN: 2330-5738,  2472-9132

ISBN: 978-1-4799-6911-1

Année de publication: 2015

Pages: 189-192

Congreso: 2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon

Type: Communication dans un congrès

GOOGLE SCHOLAR
La source de données: WoS