JUAN ENRIQUE
CARCELLER BELTRÁN
Investigador en el periodo 1993-2023
Publicaciones en las que colabora con JUAN ENRIQUE CARCELLER BELTRÁN (52)
2011
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Learning in a virtual laboratory: Educational applications of three-dimensional animations
International Journal of Innovation and Learning, Vol. 9, Núm. 3, pp. 325-337
2005
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Characterization of oxygen related defects in silicon p-n junctions
2005 Spanish Conference on Electron Devices, Proceedings
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Effects of oxygen-related traps in silicon on the generation-recombination noise
AIP Conference Proceedings
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Implications of nonparabolicity, warping, and inelastic phonon scattering on hole transport in pure Si and Ge within the effective mass framework
Journal of Applied Physics, Vol. 97, Núm. 1
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Monte Carlo simulation of velocity modulation transistors
2005 Spanish Conference on Electron Devices, Proceedings
2004
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Double gate silicon on insulator transistors. A Monte Carlo study
Solid-State Electronics, Vol. 48, Núm. 6, pp. 937-945
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Effects of oxygen related defects on the electrical and thermal behavior of a n+ - p junction
Journal of Applied Physics, Vol. 95, Núm. 2, pp. 561-570
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Image and exchange-correlation effects in double gate silicon-on-insulator transistors
Microelectronic Engineering
2003
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Effect of polysilicon depletion charge on electron mobility in ultrathin oxide MOSFETs
Semiconductor Science and Technology, Vol. 18, Núm. 11, pp. 927-937
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Electron mobility in double gate silicon on insulator transistors: Symmetric-gate versus asymmetric-gate configuration
Journal of Applied Physics, Vol. 94, Núm. 9, pp. 5732-5741
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Influence of image force and many-body correction on electron mobility in ultrathin double gate silicon on insulator inversion layers
Applied Physics Letters, Vol. 83, Núm. 15, pp. 3120-3122
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Monte Carlo simulation of remote-coulomb-scattering-limited mobility in metal-oxide-semiconductor transistors
Applied Physics Letters, Vol. 82, Núm. 19, pp. 3251-3253
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Strained-Si on Si1-xGex MOSFET mobility model
IEEE Transactions on Electron Devices, Vol. 50, Núm. 5, pp. 1408-1411
2001
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Electron transport in silicon-on-insulator devices
Solid-State Electronics, Vol. 45, Núm. 4, pp. 613-620
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Electron transport in ultrathin double-gate SOI devices
Microelectronic Engineering
2000
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Influence of technological parameters on the behavior of the hole effective mass in SiGe structures
Journal of Applied Physics, Vol. 88, Núm. 4, pp. 1978-1982
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Optimum design in a JFET for minimum generation-recombination noise
Microelectronics Reliability, Vol. 40, Núm. 11, pp. 1965-1968
1999
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Computational study of the strained-Si MOSFET: A possible alternative for the next century electronics industry
Computer Physics Communications, Vol. 121, pp. 547-549
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Electron mobility in extremely thin single-gate silicon-on-insulator inversion layers
Journal of Applied Physics, Vol. 86, Núm. 11, pp. 6269-6275
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Experimental determination of the effective mobility in NMOSFETs: a comparative study
Solid-State Electronics, Vol. 43, Núm. 4, pp. 701-707